DWL 2000 / 4000
THE ULTIMATE LITHOGRAPHY TOOL -
THE SPECIALIST FOR GRAYSCALE MODE
The DWL 66+ laser lithography system is an economical, high-resolution pattern generator for direct writing. The system features powerful options such as front- and backside alignment and a choice of 405 nm or 375 nm laser wavelength. Further advanced options include an absolute position calibration and an automatic loading system. A total of six different Write Modes are available, amongst them the High-Resolution Mode with a resolution of 300 nm. Notably, the DWL 66+ presents the ultimate performance in Grayscale exposure mode, from Standard to Professional levels: This versatile technique for the creation of complex 2.5D microstructures in thick layers of low-contrast positive photoresists is used for applications such as micro-lenses, DOEs, holograms (CGHs), and textured surfaces.
HIGH RESOLUTION PATTERN GENERATORS –
DIRECT 2D AND 2.5D WRITING FOR LARGE AREAS
The DWL 2000 and 4000 laser lithography systems constitute fast, flexible high-resolution pattern generators, capable of the Professional performance level of Grayscale Lithography. The latter allows the creation of complex 2.5D structures in thick photoresist over large areas. Most common applications of the Grayscale exposure mode include the fabrication of wafer level optics used for telecommunication or illumination market segments; it is also used in display manufacturing, and in device fabrication in Biology and the Life Sciences.
VPG+ 200 / VPG+ 400
MULTI-PURPOSE VOLUME PATTERN GENERATORS
Our Multi-Purpose Volume Pattern Generators are perfectly suited for the production of standard photomasks as well as for i-line resist applications. An ultra-high-speed exposure engine and automated alignment capability both contribute to systems that excel through high resolution, outstanding image quality, and fast throughput.
Our VPG+ 200 and 400 systems present a perfect solution for applications that use i-line resists such as SU-8 and IP 3600, for example for rapid prototyping applications in microfluidics. In combination with their high speed and resolution, the VPG+ 200 and 400 therefore provide an excellent alternative to an i-line stepper.
Typical applications for the smaller exposure area members of the VPG+ family include such demanding fields as MEMS, advanced packaging, 3D integration, LED production, and compound semiconductors.
LARGE–AREA VOLUME PATTERN GENERATORS
FOR FABRICATION OF MASKS AND DISPLAYS
Large Area VPG+ systems are perfectly equipped for applications such as photomask fabrication for advanced packaging, semiconductors, displays, color filters, LEDs, and touch panel applications. The systems support all industrial data formats and offer Mura optimization functions ensuring excellent CD uniformity and resolution. The closed-loop environmental chambers comply with the most stringent requirements for use in advanced photomask technology. Because of their speed, attractive system price, and low running costs, the Large Area VPG+ series represents the most productive solution for large area photomask applications.
THE SEMICONDUCTOR LASER MASK WRITER
The ULTRA specifically addresses the production of mature semiconductor photomasks. It provides an economical mask writer solution with all the features you require for high throughput, high precision and structure uniformity, and extremely accurate alignment. With its modern, compact build, you can easily incorporate the system into an existing mask shop infrastructure.
ADVANCED NANOFABRICATION FOR EVERYONE
NanoFrazor lithography – based on thermal Scanning Probe Lithography developed at IBM Research – is the fastest and most versatile of all Scanning Probe Lithography techniques.
The NanoFrazor Scholar is the entry level NanoFrazor system and is particularly suited for academic research groups looking for an easy way to create high-resolution nanopatterns or devices. The NanoFrazor Scholar is a compact system designed to fit in the smallest lab spaces. It can also be installed in a dedicated glovebox to enable nanolithography of sensitive materials in inert conditions.
Like all NanoFrazor tools, the Scholar can pattern features with ultra-high resolution with no need for proximity effect corrections. All the unique NanoFrazor capabilities like in-situ AFM imaging, accurate 3D grayscale lithography, markerless overlay or thermal material conversion are available with the Scholar.
REVOLUTIONIZING NANOFABRICATION — the first hybrid mix&match nanolithography tool
Fast and precise control of a heated nanoscale tip offers many unique possibilities for nanofabrication and enables innovations not feasible otherwise.
The NanoFrazor Explore performs with maximum speed, precision and reliability. The technology behind the system is the result of more than 20 years of intensive research and development that started at IBM Research in Zurich and has been extended at SwissLitho and Heidelberg Instruments.
The NanoFrazor Explore is equipped with the most advanced hard- and software to control the heatable NanoFrazor cantilevers in the best possible manner for writing and imaging. Recently, the Explore has received an integrated laser writer extension to speed up patterning of coarse features. Nano- and microfeatures can now be seamlessly and quickly written into the same resist layer using the same software platform in a single fabrication step.
ADVANCED NANOFABRICATION CAPABILITIES FOR INDUSTRY
The NanoFrazor Professional is a platform that can be customized to meet individual requirements for industrial applications. The standard Professional has all unique NanoFrazor capabilities. It is additionally equipped with a specially designed 8-inch wafer platform and an adapted high-speed piezo scanner for moving the tip. Various extensions can be added to increase speed, placement accuracy or automation.
Contact us to discuss if the NanoFrazor Professional will meet your requirements.